@book{
181-020188428,
title = {Optical and EUV lithography: a modeling perspective},
author = {Erdmann, Andreas},
address = {Bellingham, Washington},
publisher = {SPIE Press},
year = {2021},
pages = {351},
isbn = {9781510639010},
language = {English},
note = {Formerly CIP.},
url = {https://katalog.fid-bbi.de/Record/181-020188428}
}