Optical and EUV lithography : a modeling perspective

Bibliographische Detailangaben

Titel
Optical and EUV lithography a modeling perspective
verantwortlich
Erdmann, Andreas (VerfasserIn)
veröffentlicht
Bellingham, Washington: SPIE Press, 2021
Erscheinungsjahr
2021
Medientyp
Buch
Datenquelle
British Library Catalogue
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504 |a Includes bibliographical references and index. 
500 |a Formerly CIP.  |5 Uk 
650 0 |a Photolithography. 
650 0 |a Extreme ultraviolet lithography. 
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author Erdmann, Andreas
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physical xxii, 351 pages; illustrations; 26 cm
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spelling Erdmann, Andreas author., Optical and EUV lithography a modeling perspective Andreas Erdmann, Bellingham, Washington SPIE Press 2021, xxii, 351 pages : illustrations ; 26 cm, text rdacontent, unmediated rdamedia, volume rdacarrier, Also issued online., Includes bibliographical references and index., Formerly CIP. Uk, Photolithography., Extreme ultraviolet lithography., British Library STI (B) 686.323
spellingShingle Erdmann, Andreas, Optical and EUV lithography: a modeling perspective, Photolithography., Extreme ultraviolet lithography.
title Optical and EUV lithography: a modeling perspective
title_auth Optical and EUV lithography a modeling perspective
title_full Optical and EUV lithography a modeling perspective Andreas Erdmann
title_fullStr Optical and EUV lithography a modeling perspective Andreas Erdmann
title_full_unstemmed Optical and EUV lithography a modeling perspective Andreas Erdmann
title_short Optical and EUV lithography
title_sort optical and euv lithography a modeling perspective
title_sub a modeling perspective
topic Photolithography., Extreme ultraviolet lithography.
topic_facet Photolithography., Extreme ultraviolet lithography.